Tampa, Fla., November 13, 2007 — Aechelon Technology, Inc. announced today that it has been awarded a contract by Aero Simulation Inc. (ASI) to provide image generators and databases for the Okinawa CH-53E/CH-46E APT. ASI is the prime contractor for the CH-53E/CH-46E APT under NAVAIR’s Training System Contract II (TSC II).
Aechelon Technology will supply its pC-NOVA™ v4.0 image generators, to be integrated with the host computer using the CIGI 3.1 interface. The IGs will provide 5 channels of high resolution OTW/NVG visuals and one FLIR channel. As part of the program award Aechelon Technology will also develop a Unified Asia database featuring Iraq, Iran, Afghanistan and Straits of Hormuz. The system supports NASM Portable Source Initiative (PSI) formats.
About Aero Simulation Inc.
ASI is well respected within the flight simulation industry as a highly cost-effective supplier with a wide range of capabilities, including simulator modifications, upgrades and site support to more advanced design and manufacture of entire training devices for military forces and governmental agencies around the world. ASI’s offices are located at 450 East Adamo Drive, Suite 501, Tampa, FL 33605-5941. Their web site can be found at www.aerosimulation.com
About Aechelon Technology, Inc
Aechelon Technology, Inc. is a leader in real time computer graphics applications for training, simulation and entertainment markets. The company provides COTS-based, high resolution,
multi-channel, geo-specific image generators, OTW and correlated sensor databases and integration services. The company’s image generators are field proven, and are delivered with full logistics support and documentation. Aechelon Technology is ISO 9001:2008 certified, and is located on the Internet at www.aechelon.com and headquartered in San Francisco, CA.
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Director of Programs
Aechelon Technology Inc.
Aechelon Technology and pC-NOVA are trademarks of Aechelon Technology, Inc. Any other trademarks mentioned in this press release are the property of their respective owners.