TAMPA, FL, January 19, 2009 — Aechelon Technology, Inc. announced today that it has been awarded a contract by Aero Simulation Inc. (ASI) to provide image generators and databases for the CH-46E WST, device 2F173, and UH-1N WST, device 2F161, in MCAS Camp Pendleton, California. ASI is the prime contractor under NAVAIR’s Training System Contract II (TSC II).
Aechelon Technology will supply its pC-NOVA™ v4.6 image generators, to be integrated with the host computer using the CIGI 3.1 interface. The IGs will provide 5 channels of high resolution OTW/NVG visuals and FLIR and CCD channels for the sensor turret. As part of the program award Aechelon Technology will include East and West USA and West Pacific (Japan and Korea) terrain databases. The system supports NASM Portable Source Initiative (PSI) formats.
About Aero Simulation Inc.
ASI is well respected within the flight simulation industry as a highly cost-effective supplier with a wide range of capabilities, including simulator modifications, upgrades and site support to more advanced design and manufacture of entire training devices for military forces and governmental agencies around the world. ASI’s offices are located at 450 East Adamo Drive, Suite 501, Tampa, FL 33605-5941. Their web site can be found at www.aerosimulation.com
Aechelon Technology, Inc. is a leader in real time computer graphics applications for training, simulation and entertainment markets. The company provides COTS-based, high resolution, multi-channel, geo-specific image generators, OTW and correlated sensor databases and integration services. The company’s image generators are field proven, and are delivered with full logistics support and documentation. Aechelon Technology is located on the Internet at www.aechelon.com and is headquartered in San Francisco, CA.
Javier Castellar
Director of Programs
Aechelon Technology
Aechelon Technology and pC-NOVA are trademarks of Aechelon Technology, Inc. All other trademarks mentioned in this press release are the property of their respective owners.